Epi (epitaxy) txheej txheem yog qhov tseem ceeb ntawm kev loj hlob thev naus laus zis hauv kev tsim khoom lag luam. Nws epitaxies txheej txheej zoo ib leeg-siv lead ua silicon lossis silicon alloys silicon substrate los muab cov khoom siv zoo dua rau cov khoom siv txuas ntxiv. Nws yog dav siv nyob rau hauv cov khoom siv fais fab, cmos, high-ceev li, bicmos, rf chips, thiab lwm yam.
1. Cov ntsiab lus ntawm Epi txheej txheem
Epitaxy (kev tshaj tawm txoj kev loj hlob) yog hais txog kev loj hlob ntawm cov txheej txheem kev ua si ntawm cov txheej txheem kev ua kom zoo nkauj (cov khoom siv uas twb muaj lawm)
2. Lub hom phiaj tseem ceeb ntawm EPI txheej txheem
| Lub hom phiaj | Piv txwv |
| Txhim kho cov siv lead ua kom zoo | Muab cov khoom ua tau zoo, qis-kho kom tsis taus kab kev loj hlob khaubncaws sab nraud |
| Kev Tswj Doping Concentration Thiab Hom | Ib thaj av uas qis dua (qis doped) lossis ntau dua doped dua li substrate, sib sau cov cheeb tsam drift. |
| Qhia lus sib zog engineering | Qhia txog sige lossis kev ntxhov siab hauv epi txheej txhawm rau txhim kho Caricon) |
| Muab cov cuab yeej cais | Txhawb kev tsim ntawm kev sib cais ntawm cov khaubncaws sab nraud povtseg hauv Soi, Bicmos thiab lwm yam qauv |
| Txhawb cov qauv siab voltage |
Piv txwv li, LDMOS thiab IGBT yuav tsum tau tuab, qis-doped epi txheej ua thaj av drift kom tawg voltage.
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3. EPI cov txheej txheem kev faib tawm
1. Kev faib tawm los ntawm cov hom khoom
| Ntaus | Piav txog |
| Sih Epi | Feem ntau, ib txwm muaj Crystal Silicon Alitaxial Txheej |
| Sige epi | German-doped Silicon ecitaxial txheej rau lim engineering lossis rf li |
| Si: C Epi | Cov pa roj carbon doped Silicon ecitaxial txheej los txo cov domon diffusion (PMOs) |
| III-v EPI | Gaas, Inp, thiab lwm yam, tsuas yog siv nyob rau hauv cov khoom siv roj, cov khoom siv ceev (feem ntau tsis nyob hauv kab cmos tseem ceeb) |
2. Kev faib tawm los ntawm Doping hom
| Ntaus | Piav txog |
| N-hom EPI | Phosphorus \/ arsenic doped, haum rau drift txheej ntawm cov khoom fais fab xws li n-ldmos |
| P-hom EPI | Boron doped, haum rau p-hom cmos ntaus ntawv qauv |
| Intrinsic Epi | Tsawg doping, ze rau intrinsic silicon, rau cov ntawv thov siab |
3. Kev cais tawm los ntawm cov qauv txheej txheem
| Ntaus | Piv txwv |
| Ib Leeg Txheej Epi | Ib Leeg Thickness \/ Doping Qauv |
| Multilayer Epi | GRADED DOPING, xws li hloov pauv P \/ N Txheej Txheem uas yuav tsum muaj rau superjunction SJ Mosfet qauv |
| Xaiv Epi | Loj hlob tsuas yog nyob hauv thaj chaw hauv zos ntawm cov chaw seem (xws li qhov \/ ntws), siv rau cov qauv finfet lossis strained qauv |
4. Cov ntsiab lus ntawm Epi txheej txheem ntws
Kev npaj substrate:
- polished silicon wafer tu (RCA tu);
- Tshem tawm cov txheej Oxide qub (HF lossis HCC roj);
- kev txo qis los ntxuav si (100) liab qab nto
Crystal kev loj hlob (ecitaxial tshuaj tiv thaiv):
-Siv CVD (tshuaj vapor deposition);
-Cov cov tshuaj tiv thaiv roj cua:
-Sih (Silane), Slicl₄, HCL
-Dooping roj: ph₃ (phosphorus), b₂h₆ (boron), tshauv (arsenic)
Cov txheej txheem tswj tsis:
-Tsis: 900 degree ~ 1200 degree (phab ntsa kub lossis phab ntsa txias dua tshiab)
-Pressure: tsis tshua muaj siab los yog cov huab cua siab;
-Qhov nyiaj:<1μm/min (strict requirements on thickness/uniformity)
Tom qab ua:
-Tus tuab tuab nyias muaj uniformity, doping faib;
-Txoj kev ntsuas qhov siab;
-Surface kev tsom xam (piv txwv li siv Optics \/ Sem \/ AFM \/ thiab lwm yam los tshawb xyuas cov siv lead ua leLocation)
5. Community EPI thov cov xwm txheej
1. Fais Fab Cov Khoom Siv (LDMOs, igbt, Diode)
Tsawg doping, tuab epi txheej ua ib cheeb tsam drift;
Ua kom loj zuj zus voltage thiab txo kev puas tsuaj los kho.
2. Finfet \/ Cmos Kev Ua Haujlwm Siab Tshaj Plaws
Xaiv SIGE RIGE EPI nyob rau hauv qhov chaw \/ ntws;
Qhia kev sib zog, txhim kho kev mus ncig thiab txo qis tsis kam.
3. RF li (RF CMOS, HBT)
Precisely tswj sige epi txheej cov ntaub ntawv heterogeneous qauv (xws li tus poj qaib nyige);
Muab cov ntsiab lus zoo dua cov lus teb thiab cov cim tsis muaj suab.
6. Cov nyom ntawm Epi txheej txheem
| Cav | Piv txwv |
| Kev tswj hwm qhov tsis zoo | EPI txheej yuav tsum ua kom muaj kev rho tawm qis dua (EG TDD <1E4) |
| Doping precision tswj | Yuav kom ua tiav <5% kev sib txawv, tshwj xeeb tshaj yog nyob rau ntau-txheej qauv |
| Kev sib cuam tshuam kev nyiam huv | Interface impetities \/ oxidation tuaj yeem ua rau cov siv lead ua thiab hluav taws xob tsis zoo |
| Kauj ruam Qhov Siab \/ Stair tswj | Siab yuav tsum muaj rau cov photolithography txuas ntxiv thiab tiaj |
| Tus nqi | Epi khoom siv yog kim, qeeb thiab kim |
7. Kev sib txheeb ntawm Epi thiab lwm yam thev naus laus zis
| Tej txuj ci tshiab | Tus kwvtij |
| Xum | Epi tuaj yeem cog rau ntawm Silicon Txheej rau ntaus ntawv fabrication |
| Tus tav | Tau qhov twg los \/ tawm feem ntau siv Epi los qhia cov quav |
| Kev sib tshuam loj | Ntau txheej ntawm kev hloov pauv P \/ N Hom EPI txheej epi txheej txheem ib qho hluav taws xob siab ntawm lub siab cov qauv |
| High Voltage Cmos | Epi Txheej Txheej txheej hluav taws xob uas muaj cov cheeb tsam hluav taws xob siab Drift thiab sib koom ua ke ntawm Ron thiab BV nrog lub faus txheej |
Lub ntsiab
| Yam haujlwm | Zoo siab |
| Lub hom phiaj | Muab cov zoo, doping-tswj ib lub tshuab ua lead ua |
| Txoj kev | Tshuaj lom neeg vapor deposition (CVD) ib qho Crystal Epitaxy ntawm Wafers |
| Daim ntawv thov | Heev cov khoom siv, RF, Finfet, Soi, cov cuab yeej hluav taws xob, thiab lwm yam. |
| Cav | Crystal tsis xws luag, doping qhov tseeb, cov tiaj tiaj tiaj, nqi |
